Cathodic Arc Physical Vapour Deposition (CAPVD)

Cathodic Arc Physical Vapor Deposition (CAPVD) is a well-established thin-film deposition technique capable of producing coatings ranging from ultra-thin (~ 5 nm) to highly thick (~ 50 μm). The CAPVD system at ARCI is unique in India, featuring cylindrical cathodes that offer maximum target utilization and significantly reduced droplet formation up to an order of magnitude lower than conventional systems.

This state-of-the-art facility addresses diverse surface engineering requirements across major sectors such as machining, automotive, aerospace, aesthetics, and solar energy. Current R&D activities at ARCI include the development of micro- and nano-crystalline coatings, as well as composite layers of pure metals, nitrides, carbides, carbonitrides, and diamond-like carbon in configurations such as monolayer, multilayer, and gradient structures.