అవలోకనం

Magnetron sputtering is a widely used Physical Vapor Deposition (PVD) technique for producing defect-free thin films at low deposition temperatures. Unlike other PVD methods, magnetron sputtering removes material from the target through momentum transfer rather than evaporation, enabling deposition of a wide range of materials.

HiPIMS is an advanced variant of magnetron sputtering that delivers short, high-energy power pulses to the target. This results in highly ionized deposition, offering superior adhesion, high film density, and precise control over reactive processes.

At ARCI, the magnetron sputtering (Dc, Pulsed and High-Power Impulse) facility is currently a lab-scale setup equipped with both planar and cylindrical cathodes. It is designed for developing thin films critical to sectors such as automotive, aerospace, manufacturing, optics, electronics, renewable energy, biomedical, and sensors.

Key Features

  • Capable of depositing metallic and reactive coatings (metals, nitrides, oxides, carbides).
  • Suitable for thin films on internal and external surfaces of complex geometries.

Potential Applications

  • Metallic, nitride, or oxide coatings.
  • Coatings for microelectronics and Optical applications
  • Diffusion barrier coatings for gases
  • Diffusion barriers for electronic components.
  • Decorative coatings for aesthetics.
  • Biocompatible coatings for medical devices.
  • Functional coatings for sensors.
  • Solar-selective coatings for thermal applications.

Improved cylindrical magnetron cathode and a process for depositing thin films on surfaces using the said cathode” application No. 21/DEL/2008, January 3, 2008.