Overview
A Cylindrical Magnetron Sputtering System has been developed in-house to achieve uniform thin-film deposition on cylindrical substrates. The system functions on the same fundamental principle as planar magnetron sputtering but uses a cylindrical target to enable 360° coating uniformity on tubular or curved components
Key Features
Automation of the system was implemented using LabVIEW software integrated with a National Instruments PCI-6221 data acquisition (DAQ) module. The DAQ interfaces with all control and feedback signals, enabling precise monitoring and actuation of the subsystems such as:
- Vacuum system (rotary and turbo pump, pressure gauge, and pneumatic valves)
- Feedback limit switches.
- Power supplies for the magnetron target and substrate heater
- Stepper drive and motor
- Mass Flow Controller (MFC) for gas regulation
- Water Cooling and safety interlocks
A Graphical User Interface (GUI) developed in LabVIEW provides real-time visualization and control of all parameters including vacuum levels, gas flow rate, and target voltage/current. The interlock logic ensures operational safety by preventing activation of high-voltage or gas flow under unsafe conditions.
This setup allows fully automated pump-down, gas flow regulation, and sputtering sequence initiation with reliable repeatability. The PCI-6221 DAQ, although lower in channel count compared to NI-6363, offers sufficient analog and digital I/O lines for complete system control at reduced cost, ensuring cost-effectiveness and operational efficiency.