Details

Spray Pyrolysis is a robust and widely adopted thin-film deposition technique that enables uniform oxide, chalcogenide, and composite semiconductor films over heated substrates. The Holmarc HO-TH-04 system is a fully PC-controlled unit designed for precision spray, programmable motion, and stable thermal environments up to 500 °C. This facility allows accurate control of droplet size, spray density, substrate temperature, and solvent evaporation dynamics—critical for high-quality thin-film growth used in solar cells, photodetectors, and functional coatings.

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Model and Make

 Holmarc Spray Pyrolysis Equipment (Model: HO-TH-04), Holmarc, India

Specifications

Key Features:

Feature                                                            Description

  • Control System           PC-controlled system with automated spray sequence programming
  • Substrate Heater          Uniform heating up to 450 °C, PID-controlled
  • Spray Nozzle               Stepper-motor-controlled dispensing with adjustable droplet size
  • X–Y Motion                Programmable raster scanning for uniform coatings
  • Solution Reservoir      Compatible with 250 mL precursor volume
  • Deposition Area          Suitable for substrates up to 100×100 mm
  • Safety Features            Enclosed spray chamber with exhaust and thermal protection
  • Software Logging       Real-time logging of temperature, spray time, intervals, and motion path 

 

Applications:

 

➤ Thin-film growth of oxide/chalcogenide semiconductors Solar-cell absorber and buffer layers
➤ Photodetector and optoelectronic materials
➤ Transparent/functional coatings
➤ R&D of catalytic and PEC films