Details

Large-Volume Electroless Thin-Film Deposition Facility (20-Litre Capacity)

This customized electroless deposition system enables the scalable preparation of metallic, alloy, and transition-metal-phosphide thin films, particularly Ni-P, Co-P, their variants 2D chalcoginide by chemical process. These films are essential for electrochemical energy devices, conducting coatings, sensors, corrosion-resistant coatings, and tribological applications. The system supports controlled bath temperatures, continuous agitation, and uniform deposition on large-area flat or mesh substrates

Model and Make

 20-Litre Electroless Coating Facility (Custom ARCI Build)

Specifications

Key Features:

      Feature                                          Description

  • Capacity                      20-litre solution tank for batch deposition
  • Substrate Size             Supports up to 360×180 mm substrates
  • Deposition Materials   metal phsosphide, sulfide composite, and other alloys
  • Temperature Control   Digital PID-regulated heating
  • Agitation System        Continuous stirring for uniform deposition
  • Scalability                    Suitable for both R&D and semi-industrial trials
  • Compatibility               Flat plates, meshes, perforated sheets, SS substrates

 

Applications:

 

➤ Hydrogen-evolution (HER) electrodes

➤ Metal-phosphide functional films 

➤Corrosion-resistant coatings

➤ Tribological coatings

➤  Energy storage and catalytic applications