Magnetron Sputtering facility

Magnetron Sputtering - A well-known Physical Vapor Deposition (PVD) technique for producing defect-free thin films at low deposition temperatures. Works by momentum transfer to remove material from the target, enabling deposition of most materials.

High Power Impulse Magnetron Sputtering (HiPIMS) - Advanced variant of magnetron sputtering using short, high-energy power pulses. Produces highly ionized deposition for excellent adhesion, high density, and better control over reactive processes.

ARCI HiPIMS Facility - Lab-scale setup with planar and cylindrical cathodes. Unique advantages for developing thin films for sectors like automotive, aerospace, manufacturing, optics, electronics, renewable energy, biomedical, and sensors.